Electrostatic Solution for Wafer Cleaning and Drying Machines
Customer Pain Points:
Due to the high-speed rotation during wafer cleaning, excessive static electricity in the cleaning area will cause wafer damage.
Solution:
Deliver ionized air to the cleaning area through an ion air nozzle, thereby ensuring that the static electricity in the area is always kept within a reasonable range, so that the wafer cannot be damaged due to excessive static electricity.